Quartz Flow Equalization Plates are precision-designed components essential for maintaining uniform gas distribution and temperature stability during high-temperature semiconductor manufacturing processes such as diffusion, oxidation, and CVD deposition. These plates effectively guide and disperse process gases inside the furnace, ensuring that wafers within the quartz boat receive consistent and even gas exposure.

Manufactured from high-purity fused quartz, they offer excellent thermal stability, corrosion resistance, and low impurity content, which are critical for contamination-free wafer processing. Their high optical transparency facilitates process monitoring, while the durable construction withstands repeated thermal cycling. The plates’ design promotes optimal gas flow dynamics, contributing to improved layer uniformity, reduced defects, and higher yields in semiconductor fabrication.