Name:
Quartz Chamber
Function & Application:
The quartz chamber serves dual functions of safe ignition and flame monitoring in high-temperature semiconductor manufacturing processes. It safely ignites process gases, continuously monitors the flame, and maintains process stability. It is applied in oxidation, CVD deposition, and furnace tube cleaning processes in wafer manufacturing, which are high-temperature processes.
Performance Requirements:
High temperature resistance, corrosion resistance, and low impurity content.
No.5177 Qianghua West Road, Dongqian Street, Nanxun District, Huzhou City, Zhejiang Province
+86-572-3032373
+86-572-3033016
High Purity Quartz Chamber is a critical tool designed for safe ignition and continuous flame monitoring in high-temperature semiconductor manufacturing processes such as oxidation, CVD deposition, and furnace tube cleaning. Made from ultra-pure fused quartz, this chamber ensures reliable ignition of process gases while maintaining process stability and safety throughout operations.
Its robust construction provides excellent resistance to extreme temperatures and chemical corrosion, with low impurity content to prevent contamination in sensitive wafer fabrication environments. The quartz material’s inherent durability and thermal stability enable long service life under rigorous manufacturing conditions. Ideal for advanced semiconductor fabs, this chamber supports efficient, safe, and consistent process control.
High purity quartz resists chemical reactions with process gases and residues, reducing contamination risks and ensuring that wafers maintain their intended chemical and physical properties.
Quartz chambers can withstand extreme temperatures without warping or cracking. This stability is crucial for uniform heating during processes such as annealing, oxidation, and diffusion, resulting in consistent wafer quality.
The ultra-pure nature of the quartz minimizes the introduction of metallic or particulate contaminants, which could otherwise affect device yield and reliability.
Quartz chambers are designed to support optimal gas flow and even temperature distribution, which helps achieve uniform layer deposition and consistent wafer treatment across the entire batch.
High purity quartz is highly resistant to thermal shock and corrosion, extending the service life of the chamber and reducing downtime for maintenance or replacement.
Using high purity quartz chambers in wafer fabrication enhances process stability, reduces contamination, and ensures uniform thermal and gas distribution, all of which are critical for high-yield semiconductor manufacturing. Investing in quality quartz chambers directly contributes to improved wafer quality and production efficiency.