Name:
Quartz Base
Function & Application:
The quartz base serves as the core support structure for semiconductor epitaxy equipment, primarily ensuring equipment stability and process integration. Key functions include a high-precision temperature-controlled base, multi-station automated integration, and rigid deformation-resistant design. It is applied in epitaxial growth processes, which are high-temperature processes.
Performance Requirements:
High temperature resistance, corrosion resistance, and low impurity content.
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The Fused Quartz Base is a critical support component engineered for semiconductor epitaxy equipment, providing a stable and precise foundation essential for high-temperature epitaxial growth processes. Crafted from ultra-pure fused quartz, this base ensures excellent resistance to thermal stress, corrosion, and mechanical deformation, maintaining equipment integrity under demanding manufacturing conditions.
Designed with a rigid, deformation-resistant structure, it supports multi-station automated integration and delivers high-precision temperature control, which is vital for consistent epitaxial layer formation. The low impurity content minimizes contamination risks, ensuring cleanroom compliance and high wafer quality. Ideal for advanced semiconductor fabs and R&D centers, the fused quartz base frame plays a key role in achieving reliable and efficient epitaxial process performance.
Fused quartz bases are commonly used to support wafers inside diffusion and oxidation furnaces. Their ability to withstand extreme temperatures without deformation ensures that wafers remain stable and aligned, which is essential for achieving uniform thermal processing results.
Quartz bases provide excellent thermal insulation and low thermal expansion. This prevents stress or cracking in wafers during rapid heating and cooling cycles, protecting delicate semiconductor structures.
High-purity fused quartz resists chemical reactions and particle generation, which reduces the risk of contamination. This is particularly important in oxidation, CVD, and annealing processes, where even trace impurities can compromise device performance.
Fused quartz bases are designed to integrate with quartz boats, tubes, and baffles in semiconductor furnaces. Their compatibility ensures consistent wafer loading, smooth operation, and extended equipment lifespan.
Custom-made fused quartz bases are used in advanced semiconductor processes such as rapid thermal processing (RTP), ion implantation, and photolithography support systems. Their adaptability allows manufacturers to meet unique equipment specifications.
Fused quartz bases are more than just structural components—they are essential enablers of precision, purity, and process uniformity in semiconductor manufacturing. From wafer support to contamination control, their applications span across nearly every high-temperature and high-purity process step in modern fabs.