Vertical Furnace Quartz Pedestals are precision-engineered support components designed to securely hold quartz boats during high-temperature semiconductor wafer manufacturing processes such as diffusion, oxidation, CVD deposition, and annealing. Made from ultra-pure fused quartz, these pedestals offer exceptional thermal stability and corrosion resistance necessary for maintaining process integrity in vertical furnace environments.

The sandblasted surface promotes even gas dispersion, ensuring stable and uniform gas exposure to silicon wafers within the quartz boat. With low impurity content and a robust structure capable of withstanding repeated thermal cycling, these pedestals contribute to contamination-free processing and consistent high yields in advanced semiconductor fabrication.

Comparing Vertical vs. Horizontal Furnace Quartz Pedestals

1. Structural Design

Vertical Furnace Pedestals: Designed to support wafers stacked vertically, ensuring uniform heating in tall furnace chambers.

Horizontal Furnace Pedestals: Built for horizontally loaded wafers, with emphasis on stability during lateral wafer transfer.

2. Heat Distribution

Vertical: Promotes even heat flow from top to bottom, reducing temperature gradients across wafers.

Horizontal: Focuses on minimizing lateral temperature variations, critical for oxidation and diffusion processes.

3. Space and Capacity

Vertical Pedestals: Support higher wafer density, suitable for high-volume semiconductor production.

Horizontal Pedestals: Typically lower wafer capacity, but allow easier access for smaller batch processing.

4. Maintenance and Durability

Vertical: Require precise alignment; cleaning is crucial to prevent contamination over tall wafer stacks.

Horizontal: Easier to handle and replace but may be more exposed to particle accumulation.

5. Application Suitability

Vertical Furnaces: Common in advanced semiconductor fabs where uniformity and throughput are key.

Horizontal Furnaces: Often used for R&D, pilot runs, or specialized processing steps.