Name:
Epitaxial Quartz Base
Function & Application:
In semiconductor epitaxial processes, the quartz base for ion implantation serves as a critical process carrier. Its extreme temperature resistance, chemical inertness, and precise thermal field control support the accurate execution of high-energy ion beam doping. Key functions include high-energy ion beam tolerance, corrosion resistance against gas erosion, and assurance of thermal stability. It is applied in epitaxial layer deposition processes, which are high-temperature processes.
Performance Requirements:
High temperature resistance, corrosion resistance, excellent thermal stability, sandblasted surface, and low impurity content.
No.5177 Qianghua West Road, Dongqian Street, Nanxun District, Huzhou City, Zhejiang Province
+86-572-3032373
+86-572-3033016
The Epitaxial Quartz Base is a precision-engineered component essential for semiconductor epitaxial processes, particularly during high-energy ion implantation. Crafted from ultra-pure fused quartz, it offers exceptional resistance to extreme temperatures, chemical corrosion, and gas erosion, ensuring long-term durability and process reliability.
Designed with a sandblasted surface, the base provides precise thermal field control critical for accurate ion beam doping and uniform epitaxial layer deposition. Its low impurity content minimizes contamination risks, maintaining cleanroom standards and enhancing wafer quality. Ideal for advanced epitaxy equipment, the quartz base supports consistent, high-yield semiconductor manufacturing under demanding high-temperature conditions.
Epitaxial quartz bases provide stable and precise support for wafers during high-temperature epitaxial processes. By maintaining correct positioning and spacing, they prevent wafer warping or tilting, which can cause uneven deposition and defects.
High-purity quartz has excellent thermal conductivity and low thermal expansion. Epitaxial bases distribute heat evenly across the wafer surface, minimizing hot spots and temperature gradients that could compromise layer uniformity.
Quartz bases resist reactions with process gases and dopants. This chemical stability prevents contamination of the wafer surface, ensuring consistent film quality and reducing particle-induced defects.
Well-designed epitaxial quartz bases integrate smoothly with multi-station automated epitaxy equipment. Consistent alignment and positioning improve repeatability, enhancing batch-to-batch wafer uniformity and yield.
Durable quartz bases withstand repeated high-temperature cycles without deformation. This ensures sustained thermal performance and reduces the risk of wafer breakage or process variability over time.
Epitaxial quartz bases are critical for high-yield semiconductor manufacturing. By combining precise support, thermal uniformity, chemical inertness, and durability, they ensure wafers receive consistent processing conditions, directly improving product quality and yield.